New Thin Film Solar Processing System

Written by on July 15, 2011 in Solar - No comments
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After the successful launch in Munich (Germany), SINGULUS TECHNOLOGIES AG (SINGULUS) provides information about the enhanced wet-chemical processing system for thin film solar VITRUM GEN 2 at the Intersolar North America from July 12 to 14 in the Moscone Center in San Francisco (USA). With its innovative Solar portfolio including new production and process concepts, the company underlines its leading position of its successful and high-efficiency solar production technologies. The US market launch of the VITRUM GEN 2 will be in the spotlight at the SINGULUS booth 9335. It offers substantial cost-saving potential and can easily be integrated into already existing manufacturing lines.

US Market Launch of New Process Tool VITRUM for Backside and Pencil Etch
As part of the product family VITRUM GEN 2 the new processing machine simultaneously cleans back-sides and edges of thin film solar cells in a single working step. In addition to the automated process control, the new single-side etching tool protects the active layer by process hoods and performs pencil and rear side etching with brushes and chemicals. VITRUM GEN 2 is the only tool on the market that cleans the rear side and the edges in one single step without any harm to the active layers. It is used for cleaning after oven processes as well as for etching of undesirable coatings on rear side and edges, for example CdTe or CdS.

Reducing Production Steps and Costs with VITRUM GEN 2
The new VITRUM GEN 2, developed by SINGULUS STANGL SOLAR in Fürstenfeldbruck (Germany), enables reducing the production steps for a-Si/µc-Si, CIGS and CdTe thin film solar cells and thus massively saves production costs.

The VITRUM GEN 2 provides the platform for several different process steps: At a CdTe manufacturing process it performs six steps, starting with glass washing, back side cleaning CdTe, CdCl2 deposition using roller and salt removal to glass washing and developer. When producing a-Si/µc-Si and CIS/CIGS cells VITRUM features glass washing as well as TCO etching, KCN etching or NH3 treatment respectively. In addition it also provides NP, DAE and EDTA etching for substrate sizes up to 2,200.

In comparison to dipping processes, the second generation VITRUM enables homogeneous, reliable and reproducible etching. It features further advantages in compared to a dipping bath such as a higher etch length and concentration, a higher process speed of up to 5 m/min and minimized carryover.

The new design of the VITRUM GEN 2 improves the accessibility for optimized maintenance work in a large installation cabinet. Piping is similar for all liquid circuits. It offers a high cycle rate and is also easy to integrate into existing production lines. The new VITRUM GEN 2 substantially reduces the investment outlay and very rapidly pays its way.

High Market Potential for Thin Film Solar Technology
Orders for several systems were received straight after the new version’s launch in Germany. The first of these innovative systems will be shipped before the end of June 2011. The new system concept was presented at the Intersolar industry exhibition in Munich, and met with considerable interest among customers. Further sales are consequently also under negotiation.

SINGULUS plans to further expand its activities in the segments Solar and Optical Disc. The goal is to attain a leading position in the silicon and thin film solar technology and to maintain the technologic leadership in the Optical Disc segment.


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